Protect your process with the HALO QRP

Modern semiconductor deposition processes—from low-temperature epitaxy to ALD and MOCVD—operate routinely at chamber pressures far below atmosphere and approach the single-digit torr range. At the same time, process temperatures are continuously decreasing. Under these conditions, residual moisture in the chamber poses a significant threat to process quality and production yields.

Tiger Optics’ new HALO QRP is optimized to operate under these low-pressure conditions and deliver exact and reliable real-time measurement to verify moisture residue in, for example, the load lock, transfer and process chambers before H2O contaminants compromise the subsequent process step. Based on Tiger Optics’ proven Cavity Ring-Down Spectroscopy (CRDS) technology, the HALO QRP sets new standards in ease-of-use and measurement precision for this application and operates at chamber pressures as low as 1 Torr.

Designed for trace level moisture analysis in low pressure (<50 Torr) applications, the HALO QRP offers:

• Moisture detection at partial pressure of 1 µTorr and below
• Absolute accuracy and excellent precision
• Wide dynamic range—over four orders of magnitude
• Low cost of ownership and operational simplicity
• Clean technology—no external calibration gases required
• Compact analyzer footprint, also available as OEM module for equipment/system integration

Detection Limit and Sensitivity in Concentration Units (ppb)

Applications